In Situ Study of Nanostructure and Electrical Resistance of Nanocluster Films Irradiated with Ion Beams

Journal article

Peer reviewed

Weilin Jiang, Jennifer Anand Sundararajan, Tamas Varga, Mark Bowden, You Qiang and John S McCloy

Advanced Functional Materials, Vol.24(39), pp.6210-6218

2014

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Title: In Situ Study of Nanostructure and Electrical Resistance of Nanocluster Films Irradiated with Ion Beams
Creators: Weilin Jiang - Pacific Northwest National Laboratory
Jennifer Anand Sundararajan - University of Idaho
Tamas Varga - Pacific Northwest National Laboratory
Mark Bowden - Pacific Northwest National Laboratory
You Qiang - University of Idaho
John S McCloy - Washington State University
Publication Details: Advanced Functional Materials, Vol.24(39), pp.6210-6218
Identifiers: 996631612801851
Academic Unit: Physics
Language: English
Resource Type: Journal article