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Conference paper
Scaling Beyond 7nm Node: An Overview of Gate-All-Around FETs
Feng Li
2021 9th International Symposium on Next Generation Electronics (ISNE)
2021
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Title
Scaling Beyond 7nm Node: An Overview of Gate-All-Around FETs
Creators
Feng Li
Conference
2021 9th International Symposium on Next Generation Electronics (ISNE)
Identifiers
996631409501851
Academic Unit
Electrical and Computer Engineering
Language
English
Resource Type
Conference paper
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